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首页> 外文期刊>IEEE Journal of Solid-State Circuits >A 400-MHz Random-Cycle Dual-Port Interleaved DRAM (D{sup}2RAM) With Standard CMOS Process
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A 400-MHz Random-Cycle Dual-Port Interleaved DRAM (D{sup}2RAM) With Standard CMOS Process

机译:具有标准CMOS工艺的400MHz随机周期双端口交错式DRAM(D {sup} 2RAM)

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摘要

This paper describes a standard CMOS process based on embedded DRAM macro with dual-port interleaved DRAM architecture (D{sup}2RAM), which is suitable for the leading edge CMOS LSIs with both high-speed and large-scale memories on a chip. This macro exploits three key technologies: fully sense-signal-loss compensating technology based on the whole detailed noise element breakdowns, the novel striped trench capacitor (STC) cell, and the write-before-sensing (WBS) circuit by decoded write-bus. A 400-MHz random cycle access has been verified for D{sup}2RAM fabricated by a 0.15-μm standard CMOS process.
机译:本文介绍了一种基于嵌入式DRAM宏且具有双端口交错DRAM架构(D {sup} 2RAM)的标准CMOS工艺,该工艺适用于在芯片上同时具有高速和大规模存储功能的前沿CMOS LSI。该宏采用了三项关键技术:基于整个详细噪声元素分解的完全感测信号损耗补偿技术,新颖的条纹沟槽电容器(STC)单元以及解码后的写入总线的先写后感(WBS)电路。已针对通过0.15μm标准CMOS工艺制造的D {sup} 2RAM验证了400 MHz随机周期访问。

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