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1-Tbyte/s 1-Gbit DRAM Architecture Using 3-D Interconnect for High-Throughput Computing

机译:使用3-D互连进行1TB / s 1-Gbit DRAM架构的高吞吐量计算

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Aiming to resolve memory bottlenecks in multi-core system, novel 1-Tbyte/s 1-Gbit DRAM architecture based on a multi-core configuration and 3-D interconnects was developed. The DRAM stacked on a multi-core CPU has 512-bit I/Os with through-silicon-via (TSV) distributed in 16 memory cores. Five-stage pipelined architecture in the compact DRAM core was developed to reduce the operation cycle of the data-bus to 2 ns. A low-noise early-bar-write scheme for an 8-ns cycle array operation and 16-Gbit/s I/O circuits on TSV were also developed. The proposed DRAM architecture greatly improves power efficiency. TSV scheme reduces the parasitic capacitance of the interconnects between the DRAM and CPU, and multi-core architecture reduces the length of the data bus on the DRAM. A 1-Gbit DRAM was designed based on the 45-nm stand-alone DRAM process. Chip size is 51.6 mm$^{2}$ assuming 4F$^{2}$ memory cells, and the density is about 5 times higher than that of embedded DRAM. Circuit simulations confirmed the 2-ns operation of the data bus, 8-ns operation of the memory array, and 16-Gbit/s operation of I/O circuits. Power consumption is 19.5 W, providing power efficiency of 51.3 Gbyte/s/W, which is an order of magnitude higher than that of conventional DRAMs.
机译:为了解决多核系统中的内存瓶颈,开发了一种基于多核配置和3-D互连的新颖的1-TB / s 1-Gbit DRAM架构。堆叠在多核CPU上的DRAM具有512位I / O,并通过硅通孔(TSV)分布在16个存储内核中。开发了紧凑型DRAM内核中的五级流水线架构,以将数据总线的操作周期缩短至2 ns。还开发了一种用于8ns周期阵列操作和TSV上16-Gbit / s I / O电路的低噪声早期写方案。所提出的DRAM架构大大提高了功率效率。 TSV方案减少了DRAM和CPU之间互连的寄生电容,而多核体系结构则减少了DRAM上数据总线的长度。基于45纳米独立DRAM工艺设计了1Gb DRAM。假设使用4F $ ^ {2} $的存储单元,芯片尺寸为51.6 mm ^ {2} $,密度约为嵌入式DRAM的5倍。电路仿真证实了数据总线的2 ns操作,存储器阵列的8 ns操作以及I / O电路的16 Gb / s操作。功耗为19.5 W,提供51.3 Gbyte / s / W的功率效率,比常规DRAM高一个数量级。

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