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Chemiresistive gas sensing properties of nanocrystalline Co_3O_4 thin films

机译:纳米晶Co_3O_4薄膜的化学电阻式气敏特性

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摘要

The chemiresistive gas sensing characteristics of Co_3O_4 thin films - prepared by electron-beam deposition of Co films on (0001) Al_2O_3 substrate followed by oxygen annealing at three different temperatures (500℃, 650℃ and 800℃) - have been investigated for a host of gases (C_2H_5OH, CO, NO, Cl_2, NH_3 and H_2S). The results of atomic force microscopy and X-ray diffraction revealed that the grains of these films are composed of nano-crystallites (size: 24-56 nm). X-ray photoelectron spectroscopy data revealed that the content of adsorbed oxygen decreases with increasing annealing temperature. For H_2S gas in the concentration range 1-100ppm, films annealed at 650℃ exhibited high selectivity, low base line drift and highest response, which are attributed to small crystallite size, improved crystallinity, better grain-to-grain connectivity and higher adsorbed oxygen content. The H_2S sensing mechanism has been explained on the basis of the depletion of chemisorbed oxygen at the film surface.
机译:研究了Co_3O_4薄膜的化学气体感应特性,该特性是通过在(0001)Al_2O_3衬底上电子束沉积Co膜,然后在三种不同温度(500℃,650℃和800℃)下进行氧退火而制得的气体(C_2H_5OH,CO,NO,Cl_2,NH_3和H_2S)。原子力显微镜和X射线衍射的结果表明,这些膜的晶粒由纳米微晶组成(尺寸:24-56nm)。 X射线光电子能谱数据表明,随着退火温度的升高,吸附的氧含量降低。对于浓度范围为1-100ppm的H_2S气体,在650℃退火的薄膜表现出高的选择性,低的基线漂移和最高的响应性,这归因于微晶尺寸小,结晶度提高,晶粒与晶粒之间的连接性更好以及吸附的氧更高内容。已经基于膜表面化学吸附的氧的消耗解释了H_2S感测机理。

著录项

  • 来源
    《Sensors and Actuators》 |2013年第1期|38-45|共8页
  • 作者单位

    Technical Physics Division, Bhabha Atomic Research Center, Mumbai 400 085, India,Department of Physics, Guru Nanak Dev University, Amritsar 143005, India;

    Technical Physics Division, Bhabha Atomic Research Center, Mumbai 400 085, India;

    Technical Physics Division, Bhabha Atomic Research Center, Mumbai 400 085, India;

    Technical Physics Division, Bhabha Atomic Research Center, Mumbai 400 085, India;

    Department of Physics, Guru Nanak Dev University, Amritsar 143005, India;

    Department of Physics, Guru Nanak Dev University, Amritsar 143005, India;

    Technical Physics Division, Bhabha Atomic Research Center, Mumbai 400 085, India;

    Technical Physics Division, Bhabha Atomic Research Center, Mumbai 400 085, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Co_3O_4 thin films; gas sensing; XPS; adsorbed oxygen;

    机译:Co_3O_4薄膜;气体感应XPS;吸附氧;

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