首页> 外文期刊>Semiconductor science and technology >Te-doped cadmium telluride films fabricated by close spaced sublimation
【24h】

Te-doped cadmium telluride films fabricated by close spaced sublimation

机译:通过近距离升华制备的Te掺杂碲化镉薄膜

获取原文
获取原文并翻译 | 示例
       

摘要

Te-doped cadmium telluride (CdTe) films were deposited on ITO/glass substrates using the close spaced sublimation (CSS) method. The films were characterized by x-ray diffraction (XRD), the x-ray fixed-quantity (XRF) method, scanning electron microscopy (SEM) and the Hall effect. The XRD and SEM results show that appropriate Te doping would be favourable to the growth of CdTe crystallite. The Hall effect measurements indicate that the conductivity of CdTe films could be dramatically improved by Te doping. The work presented here suggests that p-type doping CdTe films can be produced using this deposition method.
机译:使用近距离升华(CSS)方法将掺Te的碲化镉(CdTe)膜沉积在ITO /玻璃基板上。通过X射线衍射(XRD),X射线固定量(XRF)方法,扫描电子显微镜(SEM)和霍尔效应对膜进行表征。 XRD和SEM结果表明适当的Te掺杂将有利于CdTe微晶的生长。霍尔效应测量表明,通过Te掺杂可以显着提高CdTe薄膜的电导率。此处提出的工作表明,可以使用这种沉积方法生产p型掺杂CdTe膜。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号