Selective and blanket liquid phase deposition of silicon dioxide on silicon nitride and tungsten silicide

摘要

In the conventional process of liquid phase deposition, silicon dioxide cannot be deposited on silicon nitride and tungsten silicide substrates. In the present study, this limitation is removed by adding aqueous ammonia to the hydrofluorosilicic acid source. A selective or blanket deposition can be controlled. The deposition rate is also enhanced.