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Power and linearity comparisons of gate- and source-terminated field-plate pseudomorphic HEMTs

机译:栅极和源极端接的场板伪晶HEMT的功率和线性比较

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GaAs-based pseudomorphic high electron mobility transistors (pHEMTs) in which the field-plate (FP) is connected to the gate terminal and the source terminal, were developed and evaluated experimentally to determine their microwave and power performance. The small gate-to-drain feedback capacitance (C_(gd)) and the stable FP-induced depletion region at high input power (P_(in)) of the source-terminated FP pHEMT (FP-S pHEMT) greatly improve the power and linearity of the FP-S pHEMT above those of the gate-terminated FP pHEMT (FP-G pHEMT). The power ratio of the fundamental to the third-order inter-modulation product (IM3) is 18.8 dBc for FP-S pHEMT for P_(in) = 0 dBm; the corresponding value for FP-G pHEMT is 12.4 dBc. These experimental results indicate that the FP architecture is more effective at high-power operation and exhibits high linearity in high-power pHEMT applications.
机译:开发并通过实验评估了基于GaAs的伪晶高电子迁移率晶体管(pHEMT),其中场板(FP)连接到栅极端子和源极端子,以确定它们的微波和功率性能。源端FP pHEMT(FP-S pHEMT)的高输入功率(P_(in))下的小栅极到漏极反馈电容(C_(gd))和稳定的FP感应耗尽区FP-S pHEMT的线性和线性高于门端FP pHEMT(FP-G pHEMT)的线性。对于FP-S pHEMT,当P_(in)= 0 dBm时,基波与三阶互调产物(IM3)的功率比为18.8 dBc。 FP-G pHEMT的相应值为12.4 dBc。这些实验结果表明,FP架构在大功率工作时更有效,并且在大功率pHEMT应用中表现出高线性度。

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