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Photoluminescent properties of InN epifilms

机译:InN外延膜的光致发光特性

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We report a detailed investigation of the photoluminescent properties of InN epifilms with free-electron concentrations ranging from 3.5 x 10~(17) cm~(-3) to 5 x 10~(19) cm~(-3). It is found that the photoluminescence (PL) peak energy strongly depends on the electron concentration. We show that the broadening of the PL spectra with increasing free-electron concentration arises from the breaking of the k = 0 selection rule. The large asymmetric line shape of the photoluminescence spectra can be well described by the free-electron recombination band model. We establish an empirical relation between the full-width at half-maximum (FWHM) value of the PL spectra and the free-electron concentration, which provides a convenient formula to determine the free-electron concentration in InN epifilms by PL measurement. We point out that the peak energy of the PL spectra does not reflect the real band gap of InN epifilms. Calculations based on the effects of Burstein-Moss absorption, band tail and band renormalization were used to analyse the PL spectra, and the fundamental band gap of the intrinsic InN film was obtained. The corresponding expression for the band gap narrowing effect of the InN film is found to be ΔE_(BGN) = 1 x 10~(-8)n~(1/3) + 3.6 x 10~(-7)n~(1/4) + 2.3 x 10~(-11)n~(1/2) eV. The temperature-dependent band gap of the intrinsic InN was fitted by the Paessler equation. The Paessler parameters of the intrinsic InN are α = 0.55 meV K~(-1), Θ = 576 K and p = 2.2. It is found that the band gap energies at T = 0 K and room temperature are close to 0.68 eV and 0.62 eV, respectively. In addition, we show that the band gap obtained from the PL spectra is in excellent agreement with that obtained from infrared absorption.
机译:我们报告了对InN外延膜的光致发光特性的详细研究,其自由电子浓度范围为3.5 x 10〜(17)cm〜(-3)至5 x 10〜(19)cm〜(-3)。发现光致发光(PL)峰值能量强烈取决于电子浓度。我们表明,随着自由电子浓度的增加,PL光谱的加宽是由k = 0选择规则的破坏引起的。通过自由电子复合能带模型可以很好地描述光致发光光谱的大的不对称线形。我们建立了PL光谱的半峰全宽(FWHM)值与自由电子浓度之间的经验关系,这为通过PL测量确定InN外延膜中的自由电子浓度提供了方便的公式。我们指出,PL光谱的峰值能量不能反映InN外延膜的真实带隙。基于Burstein-Moss吸收,能带尾和能带归一化的影响进行计算,以分析PL光谱,从而获得本征InN薄膜的基带隙。发现InN膜的带隙变窄效果的对应表达式为ΔE_(BGN)= 1 x 10〜(-8)n〜(1/3)+ 3.6 x 10〜(-7)n〜(1 / 4)+ 2.3 x 10〜(-11)n〜(1/2)eV。固有InN的温度相关带隙通过Paessler方程拟合。本征InN的Paessler参数为α= 0.55 meV K〜(-1),Θ= 576 K和p = 2.2。发现在T = 0K和室温下的带隙能量分别接近0.68eV和0.62eV。此外,我们表明,从PL光谱获得的带隙与从红外吸收获得的带隙非常一致。

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