机译:蓝宝石衬底厚度对GaN基LED性能的影响
Department of Information Communication, Leader University, Tainan 70910, Taiwan,Republic of China;
Department of Information Technology & Communication, Shih Chien University, Neimen,Kaohsiung 845, Taiwan, Republic of China;
Institute of Microelectronics & Department of Electrical Engineering, Advanced Optoelectronic Technology Center, Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan, Republic of China;
Department of Electronic Engineering, Nan Jeon Institute of Technology, Yen-Hsui, Tainan 700,Taiwan, Republic of China;
Department of Materials Science and Engineering, China University of Petroleum, Dongying City,Shandong 257061, People's Republic of China;
Institute of Microelectronics & Department of Electrical Engineering, Advanced Optoelectronic Technology Center, Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan, Republic of China;
机译:高性能基于GaN的发光二极管的蓝宝石衬底处理:蓝宝石衬底的微图案化及其对基于GaN的发光二极管中光增强的影响
机译:长宽比对具有纳米图案蓝宝石衬底的GaN基发光二极管性能的影响
机译:液相沉积氧化硅-纳米图案蓝宝石衬底制备的GaN基LED的残余应力降低且性能增强
机译:具有新型蓝宝石衬底的高性能GaN的LED,具有新型混合图案SiO_2 / AL_2O_3钝化层和TiO_2 / AL_2O_3 DBR背面反射器
机译:通过MOCVD增强了蓝宝石衬底上的III型氮化物HEMT的器件性能。
机译:凹图案蓝宝石衬底上生长的GaN基LED的晶体质量和光输出功率
机译:改善通过湿法和ICP蚀刻在蓝宝石衬底上生长的GaN基LED的性能
机译:在简单的牺牲衬底上外延生长GaN基LED。总结报告