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The reliability analysis of GaN-based light-emitting diodes with different current-blocking layers

机译:不同阻流层的GaN基发光二极管的可靠性分析

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摘要

This study employed Ar plasma treatment to selectively damage the p-GaN surface under the p-pad electrode as a current-blocking layer (CBL) on nitride-based light-emitting diodes (LEDs). Increasing the resistivity of the p-GaN region under the p-pad electrode can reduce the current flowing vertically downward from the p-pad electrode. At an injection current of 20 mA, the light output power of LEDs with Ar plasma treatment was 13% larger than that of conventional LEDs. At an injection current of 100 mA, the temperature of the p-pad metal on LEDs with Ar plasma treatment is 13 °C lower than that of the LEDs with a SiO_2 CBL. However, the electrostatic discharge endurance of LEDs with Ar plasma treatment is the worst due to the surface damage of p-GaN under the p-pad electrode.
机译:这项研究采用Ar等离子体处理,选择性地破坏了位于p焊盘电极下方的p-GaN表面,作为氮化物基发光二极管(LED)上的电流阻挡层(CBL)。增加p焊盘电极下方的p-GaN区域的电阻率可以减小从p焊盘电极垂直向下流动的电流。在20 mA的注入电流下,经过Ar等离子处理的LED的光输出功率比传统LED大13%。在100 mA的注入电流下,经过Ar等离子处理的LED上的p焊盘金属的温度比具有SiO_2 CBL的LED的温度低13°C。但是,由于在p-pad电极下p-GaN的表面损坏,经过Ar等离子处理的LED的静电放电耐久性最差。

著录项

  • 来源
    《Semiconductor science and technology》 |2011年第8期|p.55-59|共5页
  • 作者单位

    Department of Electronics Engineering, Southern Taiwan University, Tainan 710, Taiwan;

    Institute of Microelectronics, Department of Electrical Engineering, Advanced Optoelectronic Technology Center, Center for Micro/Nano Science and Technology, National Cheng Kung University,Tainan 70101, Taiwan;

    Institute of Microelectronics, Department of Electrical Engineering, Advanced Optoelectronic Technology Center, Center for Micro/Nano Science and Technology, National Cheng Kung University,Tainan 70101, Taiwan;

    Institute of Microelectronics, Department of Electrical Engineering, Advanced Optoelectronic Technology Center, Center for Micro/Nano Science and Technology, National Cheng Kung University,Tainan 70101, Taiwan;

    Epistar Corporation, Nitride Device Research and Development Center, Hsin-Shi, Tainan 744, Taiwan;

    Epistar Corporation, Nitride Device Research and Development Center, Hsin-Shi, Tainan 744, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 01:31:25

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