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Residual strains and optical properties of ZnO thin epilayers grown on r-sapphire planes

机译:在r-蓝宝石平面上生长的ZnO薄外延层的残余应变和光学性质

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摘要

ZnO epilayers with a thickness of ~360 nm were directly grown on r-sapphire planes at different temperatures (550, 500,450℃) with metal-organic chemical vapor deposition. Residual strains along the vertical direction and optical properties of the epilayers were investigated by using a variety of techniques including x-ray diffraction, low-temperature photoluminescence (PL), cathodoluminescence and Raman scattering. Compressive strains were revealed to exist in all the epilayers. Their strengths were found to reduce with increasing growth temperature. In addition, the optical properties of the epilayers were studied and the relationship between the strain and PL peak position was unveiled.
机译:通过金属有机化学气相沉积,在不同温度(550、500、450℃)下,在r-蓝宝石平面上直接生长厚度约为360 nm的ZnO外延层。通过使用多种技术,包括X射线衍射,低温光致发光(PL),阴极发光和拉曼散射,研究了沿外延层的垂直方向的残余应变和光学特性。揭示在所有外延层中都存在压缩应变。发现它们的强度随着生长温度的升高而降低。另外,研究了外延层的光学性质,揭示了应变与PL峰位置之间的关系。

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  • 来源
    《Semiconductor science and technology》 |2012年第3期|p.10.1-10.5|共5页
  • 作者单位

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China HKU-CAS Joint Laboratory on New Materials, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China;

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China HKU-CAS Joint Laboratory on New Materials, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China;

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China HKU-CAS Joint Laboratory on New Materials, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China;

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China HKU-CAS Joint Laboratory on New Materials, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China;

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China;

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China;

    Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China;

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China HKU-CAS Joint Laboratory on New Materials, The University of Hong Kong, Pokfulam Road, Hong Kong, People's Republic of China Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China;

    Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 01:31:03

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