首页> 外文期刊>Semiconductor science and technology >Enhancement in photoluminescence from 1 eV GalnNAs epilayers subject to 7 MeV electron irradiation
【24h】

Enhancement in photoluminescence from 1 eV GalnNAs epilayers subject to 7 MeV electron irradiation

机译:1 eV GalnNAs外延层受7 MeV电子辐照增强光致发光

获取原文
获取原文并翻译 | 示例
           

摘要

We have investigated the influence of 7 MeV electron irradiation (10~(14)-10~(15) cm~(-2) range) and subsequent rapid thermal annealing (RTA) on luminescence efficiency of nearly lattice-matched 1 eV GalnNAs-on-GaAs epilayers, grown by molecular beam epitaxy. The study has been done by means of 9 K photoluminescence (PL) and 300 K photoreflectance (PR) spectroscopy. Electron irradiation was found to directly promote a notable increase in PL intensity. A further PL enhancement, remarkable at the higher annealing temperature, has been seen upon two RTA stages (at 800 and 900 ℃) applied to irradiated samples as compared to a non-irradiated sample. This irradiation-promoted PL enhancement upon annealing occurred with a small additional blue-shift of PL for the lower temperature-annealed samples but no additional shift in PL was noted for the higher temperature-annealed sample. The additional annealing-induced PL blue-shift was mainly due to an irradiation-promoted enhancement in In-N bonds formation, whose magnitude does not appear to depend on dose within the studied range.
机译:我们研究了7 MeV电子辐照(10〜(14)-10〜(15)cm〜(-2)范围)和随后的快速热退火(RTA)对几乎晶格匹配的1 eV GalnNAs-的发光效率的影响。通过分子束外延生长的GaAs外延层。该研究已通过9 K光致发光(PL)和300 K光反射(PR)光谱进行。发现电子辐照直接促进PL强度的显着增加。与未辐照样品相比,在辐照样品的两个RTA阶段(分别在800和900℃下)观察到了PL的进一步增强,这在较高的退火温度下显着。退火后这种辐照促进的PL增强发生在较低温度退火样品的PL出现较小的附加蓝移,但对于较高温度退火样品则未观察到PL的附加移。退火引起的额外PL蓝移主要是由于辐照促进了In-N键形成的增强,其幅度似乎与所研究范围内的剂量无关。

著录项

  • 来源
    《Semiconductor science and technology》 |2013年第2期|21.1-21.4|共4页
  • 作者单位

    National Institute for Research and Development in Microtechnologies, Erou Iancu Nicolae 126A, 077190 Bucharest, Romania Faculty of Exact Sciences and Engineering, Hyperion University, Calea Calarasilor 169, 030615, Bucharest, Romania;

    Institute of Physics, Wroclaw University of Technology Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland;

    Faculty of Exact Sciences and Engineering, Hyperion University, Calea Calarasilor 169, 030615, Bucharest, Romania;

    Faculty of Exact Sciences and Engineering, Hyperion University, Calea Calarasilor 169, 030615, Bucharest, Romania;

    Optoelectronics Research Centre, Tampere University of Technology, PO Box 692, 33101 Tampere, Finland;

    Optoelectronics Research Centre, Tampere University of Technology, PO Box 692, 33101 Tampere, Finland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号