机译:1 eV GalnNAs外延层受7 MeV电子辐照增强光致发光
National Institute for Research and Development in Microtechnologies, Erou Iancu Nicolae 126A, 077190 Bucharest, Romania Faculty of Exact Sciences and Engineering, Hyperion University, Calea Calarasilor 169, 030615, Bucharest, Romania;
Institute of Physics, Wroclaw University of Technology Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland;
Faculty of Exact Sciences and Engineering, Hyperion University, Calea Calarasilor 169, 030615, Bucharest, Romania;
Faculty of Exact Sciences and Engineering, Hyperion University, Calea Calarasilor 169, 030615, Bucharest, Romania;
Optoelectronics Research Centre, Tampere University of Technology, PO Box 692, 33101 Tampere, Finland;
Optoelectronics Research Centre, Tampere University of Technology, PO Box 692, 33101 Tampere, Finland;
机译:11.5 MeV和1.0 MeV电子辐照的GalnP顶部电池的温度依赖性光致发光过程
机译:GalnP顶部电池的温度依赖性光致发光过程,用11.5MeV和1.0MeV电子照射
机译:低剂量1 MeV电子辐照诱导富Ga的InGaN多量子阱的光致发光增强
机译:通过用170 keV或1 MeV电子辐照产生的n型和p型4H SiC外延层中的低温光致发光来测量缺陷中心的热历史
机译:富铝氮化铝镓和氮化铝外延层和纳米结构的深紫外光致发光研究。
机译:4MeV和6MeV电子束对全皮肤照射的剂量学比较
机译:6 Mev电子辐照激子级CuInSe2单晶的光致发光研究
机译:从0.2 meV辐射到1.4 meV电子的金属电子发射