首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Temperature-dependent photoluminescence processes of GalnP top cell irradiated with 11.5 MeV and 1.0 MeV electrons
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Temperature-dependent photoluminescence processes of GalnP top cell irradiated with 11.5 MeV and 1.0 MeV electrons

机译:11.5 MeV和1.0 MeV电子辐照的GalnP顶部电池的温度依赖性光致发光过程

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摘要

The effects of 11.5 MeV electrons irradiation on the GaInP top cell of GaInP/GaAs/Ge triple-junction solar cells have been investigated by temperature-dependent photoluminescence (PL) measurements. The thermal quenching of PL intensity is observed in the temperature range of 10 K-270 K, attributing to the nonradiative recombination centers H2 (E-v + 0.55 eV) hole trap and H3 (E-v + 0.76 eV) hole trap. A slight negative thermal quenching (NTQ) of PL intensity exists at nearly 300 K and could be associated with the 0.18 eV intermediate states. The temperature-dependent photoluminescence process of GaInP top cell irradiated with 11.5 MeV electrons differs with that irradiated with 1.0 MeV electrons.
机译:通过温度相关的光致发光(PL)测量,研究了11.5 MeV电子辐照对GaInP / GaAs / Ge三结太阳能电池GaInP顶部电池的影响。在10 K-270 K的温度范围内观察到PL强度的热淬灭,这归因于非辐射复合中心H2(E-v + 0.55 eV)空穴陷阱和H3(E-v + 0.76 eV)空穴陷阱。 PL强度在300 K附近有轻微的负热猝灭(NTQ),可能与0.18 eV的中间态有关。用11.5 MeV电子辐照的GaInP顶部电池的温度依赖性光致发光过程与用1.0 MeV电子辐照的不同。

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