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Experimental investigation of self heating effect (SHE) in multiple-fin SOI FinFETs

机译:多鳍SOI FinFET自热效应(SHE)的实验研究

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摘要

In this work, the self-heating effect (SHE) on metal gate multiple-fin SOI FinFETs is studied by adopting the ac conductance technique to extract the thermal resistance and temperature rise in both n-channel and p-channel SOI FinFETs with various geometry parameters. It is shown that the SHE degrades by over 10% of the saturation output current in the n-channel and by over 7% in the p-channel. The extracted thermal resistances R_(th) increase with the scaled down gate length, reducing the number of fin and shrinking the fin width. The temperature rise caused by the SHE increases with the scaled down gate length, increasing the number of fin and shrinking the fin width under the saturated operation condition. Additionally, due to a larger power density in the n-channel SOI FinFETs under the same bias condition, the temperature in the n-channel FinFETs is higher than that in the p-channel FinFETs. Because the Si thermal conductivity decreases as the temperature increases, R_(th) is larger in the n-channel FinFETs than in the p-channel FinFETs. Therefore, tradeoffs have to be made between the thermal properties and the device's electrical performance by careful design optimizations of SOI FinFETs.
机译:在这项工作中,通过采用交流电导技术提取具有各种几何形状的n沟道和p沟道SOI FinFET的热阻和温度升高,研究了金属栅极多鳍片SOI FinFET的自热效应(SHE)参数。结果表明,SHE在n通道中的饱和输出电流降低了10%以上,在p通道中的降低了7%以上。提取的热阻R_(th)随着栅极长度的减小而增加,从而减少了鳍片的数量并缩小了鳍片的宽度。在饱和工作条件下,由SHE引起的温升随栅极长度的减小而增加,从而增加了鳍片的数量并缩小了鳍片的宽度。另外,由于在相同偏置条件下n沟道SOI FinFET的功率密度较大,n沟道FinFET的温度高于p沟道FinFET的温度。由于Si的导热系数随温度的升高而降低,因此n沟道FinFET中的R_(th)大于p沟道FinFET中的R_(th)。因此,必须通过精心设计SOI FinFET来在热性能和器件的电气性能之间进行权衡。

著录项

  • 来源
    《Semiconductor science and technology》 |2014年第11期|115021.1-115021.7|共7页
  • 作者单位

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, People's Republic of China 100871;

    Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA 94720, USA;

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871;

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871;

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871;

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871;

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871;

    Institute of Microelectronics, Peking University, Beijing, People's Republic of China 100871,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, People's Republic of China 100871;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    self-heating effect (SHE); FinFETs; silicon on insulator (SOI); thermal resistance;

    机译:自热效应(SHE);FinFET;绝缘体上硅(SOI);热阻;
  • 入库时间 2022-08-18 01:30:32

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