首页> 外文期刊>Semiconductor Science and Technology >Effects of selenious acid treatment on GaAs Schottky contacts
【24h】

Effects of selenious acid treatment on GaAs Schottky contacts

机译:亚硒酸处理对GaAs肖特基接触的影响

获取原文
获取原文并翻译 | 示例
       

摘要

The influence of selenious acid treatment on the GaAs surface and the M-GaAs interface electronic properties was studied. It is shown by XPS (x-ray photoelectron spectroscopy) analysis that such treatment deoxidizes the GaAs surface and forms a thin layer (< 3.0 nm) of selenium-gallium-arsenide compounds. Reduction of the Al-GaAs Schottky barrier effective height and low frequency noise was observed. The Schottky barrier height dependency on the metal work function is stronger for selenious-acid-treated GaAs surfaces than for conventionally cleaned ones, however far from the Schottky limit. This discrepancy is attributed to the intensity and type of interface reactions during Schottky contact formation on Se-treated surfaces.
机译:研究了亚硒酸处理对GaAs表面和M-GaAs界面电子性能的影响。 XPS(x射线光电子能谱)分析表明,这种处理使GaAs表面脱氧并形成硒-镓-砷化物化合物的薄层(<3.0nm)。观察到减小了Al-GaAs肖特基势垒的有效高度和低频噪声。硒酸处理的GaAs表面的肖特基势垒高度对金属功函数的依赖性要强于常规清洗的表面,但远未达到肖特基极限。这种差异归因于在硒处理过的表面上形成肖特基接触期间界面反应的强度和类型。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号