Intel Brings EUV Into Line

摘要

Always the driving force behind the development of ex-treme ultraviolet (EUV) lithography, Intel Corp. (San-ta Clara, Calif.) has again stepped forward to assert its lead in the implementation of the next-generation technology. The chipmaking giant announced early last month that it has installed the first commercial EUV lithography tool — the Micro Exposure Tool (MET) from Exitech Ltd. (Oxford, UK). In so doing, Intel has positioned itself to be the first company to deploy EUV lithography.