Alers Visits Interconnect Reliability Concerns

摘要

Glenn Alers is principal engineer at Novellus Systems Inc. (San Jose), where he works on integration and reliability issues associated with copper/low-k dielectric intercon-nects. Prior to joining Novellus, Alers spent seven years as a member of the technical staff at Bell Laboratories (Murray Hill, N.J.), where he worked on reliability issues of silicon-based circuits, including electromigration, thin gate oxide reliability and high-k dielectrics. He holds a Ph.D. in physics from the Uni- versity of Illinois (Urbana-Champaign).