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Preparation and characterization of Pd-Ag alloy composite membrane with magnetron sputtering

机译:磁控溅射Pd-Ag合金复合膜的制备与表征

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摘要

A Pd-Ag(24 wt/100)alloy composite membrane was prepared by the magnetron sputtering. A γ-Al_2O_3 membrane was synthesized by the sol-gel method and used as substrate of the Pd-Ag alloy film. The process parameters of the magnetron sputtering were optimized as a function of the compactness of Pd-Ag alloy film. The best membrane with a thickness of 1μm was produced with a sputtering pressure of 2.7 Pa and a substrate temperature of 400 deg. C. The membrane had an H_2/N_2 permselectivity of 51.5-1000 and an H_2 permeation rate of 0.036-1.17×10~-5 cm~3/cm~2.s. Pa, depending on operating conditions.
机译:通过磁控溅射制备了Pd-Ag(24 wt / 100)合金复合膜。通过溶胶-凝胶法合成了γ-Al_2O_3膜,并将其用作Pd-Ag合金膜的基底。磁控溅射的工艺参数根据Pd-Ag合金膜的致密性进行了优化。在2.7 Pa的溅射压力和400°C的基板温度下生产出厚度最好的1μm膜。该膜的H_2 / N_2渗透选择性为51.5-1000,H_2渗透率为0.036-1.17×10〜-5cm〜3 / cm〜2.s。 Pa,取决于操作条件。

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