DEPOSITION OF NANOSILVER-ORGANOSILICON COMPOSITE FILMS USING AN ATMOSPHERIC PRESSURE DC PLASMA JET

摘要

Silver nanoparticles embraced hybrid thin films were deposited by an atmospheric pressure direct current plasma jet system using tetramethyldisiloxane as organosilicon precursor. Nanoparticles were directly introduced into the process. The characterization of the hybrid films was investigated using XPS and radio frequency glow discharge optical emission spectroscopy (RF-GD-OES). It was found that composite films with Ag-NPs can be deposited by our method with the silver content in the film up to 50%.