This research disclosure relates to protecting optical components from degradation, In particular, it may he desirable to protect optical components used in HUV lithographic systems such as those used to fabricate integrated circuit chips. In such systems, degradation of optical components such as mirrors is known to occur where there are high concentrations of EUV radiation. This degradation is irreversible and. for example, can cause mirrors to experience permanent reflection loss. Such degradation may be caused by nitrogen, hydrogen and/or oxygen ions impinging on the optical component surface to stimulate chemical reactions such as oxidation. Alternatively or in addition, the ions may penetrate or attack a coating present on the surface of the optical component to create physical damage which then leaves the layers underneath the coating susceptible to degradation.
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