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首页> 外文期刊>Proceedings of the IEEE >STM/AFM nano-oxidation process to room-temperature-operated single-electron transistor and other devices
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STM/AFM nano-oxidation process to room-temperature-operated single-electron transistor and other devices

机译:STM / AFM纳米氧化工艺用于室温操作的单电子晶体管和其他器件

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摘要

Application of a scanning tunneling microscopy (STM) and an atomic force microscopy (AFM) to electron devices and an optical device are introduced in this paper. Using STM tip/AFM cantilever as a cathode, surfaces of a metal or a semiconductor are oxidized to form a few tens of nanometers-wide oxidized metal line or an oxidized semiconductor line, which works as an energy barrier for an electron. A single-electron transistor (SET), a photoconductive switch, and a high-electron mobility transistor (HEMT) are fabricated using this fabrication process. The fabricated SET operates even at high room temperatures and shows the large Coulomb gap and staircase of 200-mV periods and the large Coulomb oscillation periods of 406 mV. The fabricated photoconductive switch shows a ultra-fast response time, i.e., a full-width at half-maximum response of 380 fs at a bias voltage of 10 V. The drain current of HEMT was controlled by the oxidized semiconductor wire on the channel region formed by this fabrication process.
机译:介绍了扫描隧道显微镜(STM)和原子力显微镜(AFM)在电子器件和光学器件中的应用。使用STM尖端/ AFM悬臂作为阴极,金属或半导体的表面被氧化以形成数十纳米宽的氧化金属线或氧化半导体线,其充当电子的能量屏障。使用该制造工艺来制造单电子晶体管(SET),光电导开关和高电子迁移率晶体管(HEMT)。制成的SET即使在较高的室温下也能工作,并且显示出200 mV周期的大库仑间隙和阶梯以及406 mV的大库仑振荡周期。所制造的光电导开关显示出超快的响应时间,即在10 V偏置电压下的半峰全宽响应为380fs。HEMT的漏极电流由沟道区上的氧化半导体线控制通过该制造过程形成的。

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