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Fast System to measure the dynamic on-resistance of on-wafer 600 V normally off GaN HEMTs in hard-switching application conditions

机译:快速系统测量晶圆600V的动态导通电阻,通常在硬开关应用条件下熄灭GaN Hemts

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摘要

This study presents a novel system to investigate the on-wafer level dynamic properties of GaN-based power transistors in hard-switching application conditions. The system is able to analyse devices with an on-resistance (R-DSON) in the range from few ohms to hundreds of ohms, and can be effectively used to improve the development process of GaN high electron mobility transistors (HEMTs) power devices at the wafer level. Contrary to the conventional double-pulse setup, where a resistive load is usually used in combination with a very low duty cycle, the dynamicR(DSON)is acquired during realistic operating conditions, in a boost converter circuit. Consequently, the authors' system is able to study not only the field-activated trapping processes, but also those induced by hard-switching conditions, i.e. promoted by hot electrons and self-heating. The maximum working voltage (600 V) and the minimumR(DSON)measurement time after turn-on (2 mu s) allow evaluating the operation limit of the devices in a voltage/frequency range close to real switching conditions. Working on the wafer level allows a more realistic assessment of the dynamicR(DSON)behaviour before the packaging phase, which is very important to improve the production and development process of GaN-HEMT devices.
机译:本研究提出了一种新颖的系统,用于研究GaN基功率晶体管在硬切换应用条件下的晶圆级动态特性。该系统能够分析具有在几个欧姆到数百欧姆的电阻(R-DSON)的设备,并且可以有效地用于改善GaN高电子迁移率晶体管(HEMT)电力装置的开发过程晶圆水平。与传统的双脉冲设置相反,在电阻负载通常与非常低的占空比结合使用的情况下,在升压转换器电路中在现实操作条件下获取动态R(DSON)。因此,作者的系统不仅能够研究现场激活的捕获过程,而且还能够通过硬电子和自加热促进的硬切换条件引起的那些。开启(2μs)之后的最大工作电压(600 V)和最小值(DSON)测量时间允许评估在接近真实切换条件的电压/频率范围内的器件的操作限制。在晶圆水平上工作允许在包装阶段之前对动态的动态(DSON)行为进行更现实的评估,这对于改善GaN-HEMT器件的生产和开发过程非常重要。

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