机译:X射线衍射成像可预测直径450毫米硅晶片中裂纹扩展的度量
Department of Physics, Durham University, South Road, Durham DH1 3LE, UK;
University of Freiburg, Kristallographie, Geowissenschaftliches Institut, Freiburg, Germany;
Karlsruhe Institute of Technology, Institut fuer Synchrotronstrahlung, Karlsruhe, Germany;
Karlsruhe Institute of Technology, Institut fuer Synchrotronstrahlung, Karlsruhe, Germany;
Dublin City University, School of Electronic Engineering, Dublin 9, Ireland;
Dublin City University, School of Electronic Engineering, Dublin 9, Ireland;
Jordan Valley Semiconductors UK Ltd, Durham DH1 1TW, UK;
Jordan Valley Semiconductors UK Ltd, Durham DH1 1TW, UK;
Department of Physics, Durham University, South Road, Durham DH1 3LE, UK;
Department of Physics, Durham University, South Road, Durham DH1 3LE, UK;
CEIT and Tecnun (University of Navarra), 20018 San Sebastian, Spain;
CEIT and Tecnun (University of Navarra), 20018 San Sebastian, Spain;
University of Freiburg, Kristallographie, Geowissenschaftliches Institut, Freiburg, Germany;
X-ray diffraction imaging; synchrotron radiation; 450-mm Si wafer; crack propagation;
机译:实时X射线衍射成像技术,用于半导体晶圆计量和高温原位实验
机译:实时的直接X射线衍射成像和不规则硅晶圆破损
机译:结合使用三维X射线衍射成像和显微拉曼光谱技术对硅片上等离子弧引起的损伤进行无损评估
机译:使用同步X射线反射率和布拉格衍射硅损失计量
机译:轻元素杂质(O,C和N)对光伏硅晶片的力学性能和裂纹萌生/传播的影响。
机译:实时的直接X射线衍射成像和不规则硅晶圆破损
机译:不规则硅片破损的实时直接和衍射X射线成像