2-D analytic model for inductively coupled plasma sources. I. Electromagnetic model and kinetic analysis

摘要

Inductively coupled plasma sources (ICPS) have recently received increasing interest for semiconductor etching and deposition. A 2-D (r, z) electromagnetic (EM) model of ICPS is developed in terms of the mode analysis (MA) technique. Based upon the eigenmode expansion, a closed-form of the vector and scalar potentials of the EM fields is obtained, which provides exact and fast computing for the EM fields in the structure. By means of the Boltzmann-Vlasov equation, a 2-D model is established to describe the kinetic behaviors of plasmas. The closed-form solution for calculating induced space-currents is given, in which a collisionless coupled damping dominates the interaction mechanism between the induced RF wave and plasmas. In this connection, the 2-D coupled damping effect will be analyzed in detail in the following paper.