首页> 外文期刊>IEEE Transactions on Plasma Science >Effects of Ultraviolet Irradiation and Atomic Oxygen Erosion on Total Electron Emission Yield of Polyimide
【24h】

Effects of Ultraviolet Irradiation and Atomic Oxygen Erosion on Total Electron Emission Yield of Polyimide

机译:紫外线和原子氧侵蚀对聚酰亚胺总电子发射率的影响

获取原文
获取原文并翻译 | 示例

摘要

Polymers used on low earth orbit (LEO) spacecraft surface suffer from an ultraviolet (UV) irradiation and orbital atomic oxygen (AO) erosion. These degradations may change the total electron emission yield (TEEY) of the materials and ultimately result in unexpected surface charging. In this paper, we chose polyimide (PI) film, a thermal control material, and carried out two types of ground-based degradation. The degradation methods were UV irradiation with five different equivalent solar hours, and AO erosion with two fluences equivalent to 0.5 and 1 year LEO flight time, respectively. Using an Auger microscope-based TEEY measurement system with a scanning measuring method, the TEEY of virgin and degraded PI films were tested and analyzed comparatively. The X-ray photoelectron spectrum, field-emission scanning electron microscope, and computational simulations were also used for element bonds analysis, roughness imaging, and electron depth calculation to discover the mechanisms of the degradation and their effects on the TEEY of the material.
机译:低地球轨道(LEO)航天器表面上使用的聚合物会遭受紫外线(UV)辐射和轨道原子氧(AO)侵蚀。这些降解可能会改变材料的总电子发射率(TEEY),并最终导致意外的表面充电。在本文中,我们选择一种热控制材料聚酰亚胺(PI)膜,并进行了两种基于地面的降解。降解方法是用五个不同的等效太阳小时进行紫外线照射,并以两个通量分别相当于0.5和1年LEO飞行时间进行AO侵蚀。使用基于Auger显微镜的TEEY测量系统和扫描测量方法,对原始和降解PI膜的TEEY进行了测试和比较分析。 X射线光电子能谱,场发射扫描电子显微镜和计算模拟也用于元素键分析,粗糙度成像和电子深度计算,以发现降解机理及其对材料TEEY的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号