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首页> 外文期刊>IEEE Transactions on Plasma Science >A 3-D Theoretical Model of Thermal Breakdown in Semiconductor Devices Under Multiple Pulses
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A 3-D Theoretical Model of Thermal Breakdown in Semiconductor Devices Under Multiple Pulses

机译:多个脉冲下半导体器件热击穿的3D理论模型

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摘要

The preexisting theoretical modeling of thermal breakdown in semiconductor devices under a single pulse is summarized, through which the relationship between failure power and pulsewidth, as well as the frequency can be obtained. In order to investigate the thermal accumulation effect in a semiconductor device under multiple pulses, the theoretical model of thermal breakdown affected by pulsewidth and pulse period is established in this article. The heat transfer equation is solved by Green's function method, and the error function is approximated. Then, the expressions of temperature in the defect including pulsewidth and pulse period are derived. The change rules of temperature in the defect and failure power versus pulse repetition frequency (PRF) are obtained and discussed. Meanwhile, the thermal accumulation effect as a function of PRF and duty cycle is analyzed.
机译:总结了单个脉冲下半导体器件热击穿的已有理论模型,通过该模型可以得出故障功率与脉冲宽度以及频率之间的关系。为了研究半导体器件在多个脉冲下的热累积效应,建立了受脉冲宽度和脉冲周期影响的热击穿理论模型。用格林函数法求解热传递方程,并近似误差函数。然后,导出包括脉冲宽度和脉冲周期在内的缺陷的温度表达式。获得并讨论了缺陷温度的变化规律以及失效功率与脉冲重复频率(PRF)的关系。同时,分析了热累积效应与PRF和占空比的关系。

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