High Quality SiO2-like Layers by Large Area Atmospheric Pressure Plasma Enhanced CVD: Deposition Process Studies by Surface Analysis

著录项

• 来源
  《Plasma processes and polymers》 |2009年第10期|693-702|共10页
• 作者

  Peter Antony Premkumar; Sergey A. Starostin; Hindrik de Vries; Roger M. J. Paffen; Mariadriana Creatore; Tom J. Eijkemans; Paul M. Koenraad; Mauritius C. M. van de Sanden;

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• 作者单位

  Materials Innovation Institute (M2i) Mekelweg 2 P.O. Box 2008 2600 GA Delft The Netherlands Plasma and Materials Processing Group Department of Applied Physics Eindhoven University of Technology P.O. Box 513 5600 MB Eindhoven The Netherlands;

  Materials Innovation Institute (M2i) Mekelweg 2 P.O. Box 2008 2600 GA Delft The Netherlands Plasma and Materials Processing Group Department of Applied Physics Eindhoven University of Technology P.O. Box 513 5600 MB Eindhoven The Netherlands;

  FUJIFILM Manufacturing Europe B.V P.O. Box 90156 Tilburg The Netherlands;

  FUJIFILM Manufacturing Europe B.V P.O. Box 90156 Tilburg The Netherlands;

  Plasma and Materials Processing Group Department of Applied Physics Eindhoven University of Technology P.O. Box 513 5600 MB Eindhoven The Netherlands;

  Photonics and Semiconductor Nanophysics Group Department of Applied Physics Eindhoven University of Technology P.O. Box 513 5600 MB Eindhoven The Netherlands;

  Photonics and Semiconductor Nanophysics Group Department of Applied Physics Eindhoven University of Technology P.O. Box 513 5600 MB Eindhoven The Netherlands;

  Plasma and Materials Processing Group Department of Applied Physics Eindhoven University of Technology P.O. Box 513 5600 MB Eindhoven The Netherlands;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  atmospheric pressure glow discharges (APGD); atomic force microscopy (AFM); dielectric barrier discharges (DBD); films; hexamethyldisiloxane (HMDSO); roll-to-roll reactor;

  机译：大气压辉光放电（APGD）;原子力显微镜（AFM）;介质阻挡放电（DBD）;薄膜;六甲基二硅氧烷（HMDSO）;卷对卷反应器;