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First principles simulations of the structural and electronic properties of silicon nanowires

机译:硅纳米线的结构和电子特性的第一性原理模拟

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We report the results of first principles studies of the structural and electronic properties of hydrogen-passivated silicon nanowires with [001], [011], and [111] growth directions and diameters ranging from 1 to 3 nm. We show that the growth direction, diameter, and surface structure all have a significant effect on the structural stability, electronic band gap, band structure, and band-edge effective masses of the nanowires. The band gap is found to decrease with increasing diameter and to be further reduced by surface reconstruction. While the electron and hole effective masses are found to depend on NW size for [001] and [111] NWs, they are almost independent of size for [011] NWs. Our results suggest the possibility of engineering the properties of nanowires by manipulating their diameter, growth direction, and surface structure. Finally, we use FEFF calculations to predict the extended x-ray absorption fine structure spectra produced by the relaxed atomic structure of the NWs and show that these spectra can serve as a tool for detecting surface reconstructions on NWs.
机译:我们报告了氢钝化的硅纳米线的结构和电子特性的第一性原理研究的结果,该纳米线具有[001],[011]和[111]生长方向,直径范围为1到3 nm。我们表明,生长方向,直径和表面结构都对纳米线的结构稳定性,电子带隙,能带结构和能带边缘有效质量有重大影响。发现带隙随着直径的增加而减小,并且通过表面重构而进一步减小。尽管发现电子和空穴有效质量取决于[001]和[111] NW的NW尺寸,但它们几乎与[011] NW的尺寸无关。我们的结果表明,可以通过控制纳米线的直径,生长方向和表面结构来设计其特性。最后,我们使用FEFF计算来预测由NW的弛豫原子结构产生的扩展X射线吸收精细结构光谱,并表明这些光谱可以用作检测NW上表面重建的工具。

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