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Temperature-dependent transport in a sixfold degenerate two-dimensional electron system on a H-Si(111) surface

机译:H-Si(111)表面上六倍简并二维电子系统中依赖温度的传输

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摘要

Low-field magnetotransport measurements on a high-mobility (μ= 110,000 cm~2/Vs) two-dimensional electron system on a H-terminated Si(111) surface reveal a sixfold valley degeneracy with a valley splitting ≤0.1 K. The zero-field resistivity ρ_(xx) displays strong temperature dependence for 0.07≤T≤25 K as predicted for a system with high degeneracy and large mass. We present a method for using the low-field Hall coefficient to probe intervalley momentum transfer (valley drag). The relaxation rate is consistent with Fermi-liquid theory but a small residual drag as T→0 remains unexplained.
机译:在H封端的Si(111)表面上的高迁移率(μ= 110,000 cm〜2 / Vs)二维电子系统上的低场磁迁移测量显示出六重峰谷简并性,谷峰分裂≤0.1K.零场电阻率ρ_(xx)对于0.07≤T≤25K表现出强烈的温度依赖性,这对于具有高简并性和高质量的系统而言是预测的。我们提出了一种使用低场霍尔系数来探查间隔动量传递(谷阻力)的方法。弛豫速率与费米液体理论一致,但是当T→0时仍有少量残余阻力无法解释。

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  • 来源
    《Physical review》 |2009年第16期|93-96|共4页
  • 作者单位

    Laboratory for Physical Sciences, University of Maryland-College Park, College Park, Maryland 20740, USA;

    Laboratory for Physical Sciences, University of Maryland-College Park, College Park, Maryland 20740, USA;

    Laboratory for Physical Sciences, University of Maryland-College Park, College Park, Maryland 20740, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Laboratory for Physical Sciences, University of Maryland-College Park, College Park, Maryland 20740, USA;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    electronic transport in interface structures; magnetoresistance; landau levels;

    机译:接口结构中的电子传输;磁阻兰道水平;

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