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首页> 外文期刊>Physical review >Two-dimensional ferromagnet/semiconductor transition metal dichalcogenide contacts: p-type Schottky barrier and spin-injection control
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Two-dimensional ferromagnet/semiconductor transition metal dichalcogenide contacts: p-type Schottky barrier and spin-injection control

机译:二维铁磁体/半导体过渡金属二硫化碳触点:p型肖特基势垒和自旋注入控制

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摘要

We study the ferromagnet/semiconductor contacts formed by transition metal dichalcogenide monolayers, focusing on semiconducting MoS_2 and WS_2 and ferromagnetic VS_2. We investigate the degree of p-type doping and demonstrate tuning of the Schottky barrier height by vertical compressive pressure. An analytical model is presented for the barrier heights that accurately describes the numerical findings and is expected to be of general validity for all transition metal dichalcogenide metal/semiconductor contacts. Furthermore, magnetic proximity effects induce a 100% spin polarization at the Fermi level in the semiconductor where the spin splitting increases up to 0.70 eV for increasing pressure.
机译:我们研究了过渡金属二硫化碳单层形成的铁磁体/半导体触点,重点是半导体MoS_2和WS_2以及铁磁VS_2。我们研究了p型掺杂的程度,并通过垂直压缩压力演示了肖特基势垒高度的调整。提出了用于势垒高度的分析模型,该模型可以准确地描述数值发现,并有望对所有过渡金属二卤化金属/半导体触点具有普遍有效性。此外,磁邻近效应会在半导体的费米能级上引起100%的自旋极化,其中自旋分裂增加至0.70 eV,以增加压力。

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