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Comparative study of intersubband absorption in AlGaN/GaN and AlInN/GaN superlattices: Impact of material inhomogeneities

机译:AlGaN / GaN和AlInN / GaN超晶格中子带间吸收的比较研究:材料不均匀性的影响

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摘要

We report a systematic and quantitative study of near-infrared intersubband absorption in strained AlGaN/GaN and lattice-matched AlInN/GaN superlattices grown by plasma-assisted molecular-beam epitaxy as a function of Si-doping profile with and without <5 doping. For AlGaN/GaN, we obtained good theoretical agreement with experimental measurements of transition energy, integrated absorbance and linewidth by considering many-body effects, interface roughness, and calculations of the transition lifetime that include dephasing. For the AlInN/GaN system, experimental measurements of the integrated absorbance due to the superlattice transitions produced values more than one order of magnitude lower than AlGaN/GaN heterostructures at similar doping levels. Furthermore, observed transition energies were roughly 150 meV higher than expected. The weak absorption and high transition energies measured in these structures is attributed to columnar alloy inhomogeneity in the AlInN barriers observed in high-angle annular dark-field scanning transmission electron microscopy. We simulated the effect of these inhomogeneities using three-dimensional band-structure calculations. The inhomogeneities were modeled as AlInN nanorods with radially varying In composition embedded in the barrier material of the superlattice. We show that inclusion of the nanorods leads to the depletion of the quantum wells (QWs) due to localization of charge carriers in high-in-containing regions. The higher energy of the intersubband transitions was attributed to the relatively uniform regions of the QWs surrounded by high Al (95%) composition barriers. The calculated transition energy assuming Al_(0.95)In_(0.05)N barriers was in good agreement with experimental results.
机译:我们报告了系统化和定量化的研究,研究了在等离子辅助分子束外延作用下生长的应变AlGaN / GaN和晶格匹配的AlInN / GaN超晶格中的近红外子带吸收与Si掺杂分布的关系,有和没有<5掺杂。对于AlGaN / GaN,我们通过考虑多体效应,界面粗糙度以及包括相移在内的过渡寿命的计算,获得了与过渡能量,积分吸收度和线宽的实验测量值良好的理论一致性。对于AlInN / GaN系统,在相似的掺杂水平下,由于超晶格跃迁导致的积分吸光度的实验测量值比AlGaN / GaN异质结构低一个数量级。此外,观察到的跃迁能量大约比预期高150 meV。在这些结构中测得的弱吸收能和高跃迁能归因于在高角度环形暗场扫描透射电子显微镜中观察到的AlInN势垒中的柱状合金不均匀性。我们使用三维带结构计算模拟了这些不均匀性的影响。不均匀性被建模为AlInN纳米棒,其中的In成分径向变化,嵌入In的超晶格势垒材料中。我们表明,由于高载量区域中载流子的局部化,纳米棒的包含导致量子阱(QWs)的耗尽。子带间跃迁的较高能量归因于被高Al(95%)成分势垒包围的QW的相对均匀区域。假设Al_(0.95)In_(0.05)N势垒,计算的跃迁能与实验结果吻合良好。

著录项

  • 来源
    《Physical review》 |2013年第23期|235306.1-235306.10|共10页
  • 作者单位

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA;

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA,Birck Nanotechnology Center, West Lafayette, Indiana 47907, USA;

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA;

    Birck Nanotechnology Center, West Lafayette, Indiana 47907, USA,School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, USA;

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA,Birck Nanotechnology Center, West Lafayette, Indiana 47907, USA;

    Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA,Birck Nanotechnology Center, West Lafayette, Indiana 47907, USA;

    Birck Nanotechnology Center, West Lafayette, Indiana 47907, USA,School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA;

    Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York, 11973, USA;

    Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA,Birck Nanotechnology Center, West Lafayette, Indiana 47907, USA,School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, USA,School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, USA;

    Department of Physics, Purdue University, West Lafayette, Indiana 47907, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    quantum wells; Ⅱ-Ⅵ semiconductors;

    机译:量子阱Ⅱ-Ⅵ半导体;

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