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Scattering of carriers by coupled plasmon-phonon modes in bulk polar semiconductors and polar semiconductor heterostructures

机译:体极性半导体和极性半导体异质结构中耦合等离子体激元-声子模式的载流子散射

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摘要

We present a general treatment of carrier scattering by coupled phonon-plasmon collective modes in polar semiconductors, taking anharmonic phonon decay into account and self-consistently calculating carrier momentum relaxation rates and carrier mobility in a parabolic band model. We iteratively solve the weak-field Boltzmann equations for carriers and collective modes and obtain their nonequilibrium distribution functions. Both the scattering rates and the anharmonic decay of the coupled modes are expressed through the total dielectric function of the semiconductor, consisting of a damped lattice dielectric function, and a temperature dependent random phase approximation dielectric function for the carrier plasma. We show that the decay of the coupled modes has a significant effect on the contribution to the mobility limited by carrier-coupled mode scattering. We also propose a scalar quantity, the phonon dissipation weight factor, with which this effect can be estimated from an analytic expression. We apply this treatment to dynamically screened electron-longitudinal optical phonon scattering in bulk polar semiconductors, and to dynamically screened remote phonon scattering in polar heterostructures where monolayers of M0S_2 are sandwiched between various polar dielectrics. We find that a dynamic treatment of the remote phonon scattering yields mobilities up to 75% higher than a static screening approximation does for structures which consist of a monolayer of MoS_2 between hafnia and silica. Moreover, we show that accounting for the nonzero thickness of the M0S2 interface layer has an important effect on the calculated mobility in the same structure.
机译:我们提出了一种在极性半导体中通过耦合声子-等离子体激元集体模式进行载流子散射的一般处理,考虑了非谐声子衰减并自洽地计算了抛物能带模型中的载流子动量弛豫率和载流子迁移率。我们迭代求解载流子和集体模态的弱场Boltzmann方程,并获得它们的非平衡分布函数。耦合模式的散射率和非谐衰减都通过半导体的总介电函数表示,该函数由阻尼晶格介电函数和载流子等离子体的随温度变化的随机相位近似介电函数组成。我们表明,耦合模的衰减对载流子耦合模散射限制的迁移率的贡献有重大影响。我们还提出了一个标量,即声子耗散权重因子,可以用解析表达式来估算这种效应。我们将这种处理方法应用于块状极性半导体中的动态屏蔽电子-纵向光学声子散射,以及应用于极性异质结构中的动态屏蔽远程声子散射,在极性异质结构中,M0S_2单层夹在各种极性电介质之间。我们发现,对于由在氧化f和二氧化硅之间的单层MoS_2组成的结构,动态处理远程声子散射所产生的迁移率比静态筛选近似值高出75%。此外,我们表明,考虑到M0S2界面层的非零厚度,对相同结构中计算出的迁移率具有重要影响。

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  • 来源
    《Physical review. B, Condensed Matter And Materals Physics》 |2017年第4期|045210.1-045210.29|共29页
  • 作者

    Anna Hauber; Stephen Fahy;

  • 作者单位

    Tyndall National Institute, Lee Makings, Dyke Parade, Cork, Ireland and Department of Physics, University College Cork, Cork, Ireland;

    Tyndall National Institute, Lee Makings, Dyke Parade, Cork, Ireland and Department of Physics, University College Cork, Cork, Ireland;

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