首页> 外文期刊>Physica Status Solidi. A, Applications and Materials Science >Structure, ferromagnetism and magnetotransport of epitaxial (Ga,Mn)As/GaAs structures
【24h】

Structure, ferromagnetism and magnetotransport of epitaxial (Ga,Mn)As/GaAs structures

机译:外延(Ga,Mn)As / GaAs结构的结构,铁磁性和磁输运

获取原文
获取原文并翻译 | 示例
           

摘要

in this review, we describe the structural, magnetic and magnetotransport properties of one of the most advanced ferromagnetic semiconductor material systems, (Ga,Mn)As/GaAs heterostructures and nanostructures. Molecular beam epitaxy at low substrate temperature is applied to deposit epitaxial layers without MnAs cluster formation but with homogeneous incorporation of substitutional Mn up to about 8% content and with concomitant hole carrier densities in the 10(21) cm(-3) range. Epitaxial strain, Mn content, p-doping and defects that are related to low-temperature growth may strongly influence the ferromagnetic properties, like Curie temperature, remanent magnetization and magnetic anisotropy. This is well understood within the Zener model for ferromagnetic ordering of Mn ions that is mediated by p-d exchange interaction with free holes in the complex, anisotropic valence band states. The interplay of ferromagnetism and electronic band structure manifests in the various magnetotransport phenomena, like anomalous Hall effect and spin valve tunneling transport. In particular, tunneling structures reveal many novel features, such as the tunneling anisotropic magnetoresistance (TAMR), that highlight the interplay of magnetic and electronic properties and may be pathways to future spintronics devices. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
机译:在这篇综述中,我们描述了最先进的铁磁半导体材料系统之一(Ga,Mn)As / GaAs异质结构和纳米结构的结构,磁和磁传输性质。在低衬底温度下使用分子束外延来沉积外延层,而不会形成MnAs团簇,但可均匀掺入约8%的Mn,且空穴载流子密度在10(21)cm(-3)范围内。外延应变,Mn含量,p掺杂以及与低温生长有关的缺陷可能会严重影响铁磁性能,例如居里温度,剩余磁化强度和磁各向异性。在齐纳模型中,锰离子的铁磁有序性是众所周知的,它是通过与复杂各向异性价带态中自由空穴的p-d交换相互作用介导的。铁磁和电子能带结构的相互作用表现在各种磁传输现象中,例如异常霍尔效应和自旋阀隧穿传输。特别地,隧穿结构揭示了许多新颖的特征,例如隧穿各向异性磁阻(TAMR),突出了磁性能和电子性能的相互作用,并且可能成为未来自旋电子器件的途径。 (c)2006年WILEY-VCH Verlag GmbH&Co. KGaA,魏因海姆。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号