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首页> 外文期刊>Physica status solidi >Determination of stacking fault densities in 3C-SiC crystals by diffuse X-ray scattering
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Determination of stacking fault densities in 3C-SiC crystals by diffuse X-ray scattering

机译:弥散X射线散射法测定3C-SiC晶体的堆垛层错密度。

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摘要

Thick 3C-SiC single crystals grown by continuous-feed physical vapor transport (CF-PVT) are studied by high-resolution X-ray reciprocal space mapping. These crystals contain Shockley-type stacking faults (SFs) lying in the {111} planes, which give rise to diffuse intensity streaks along the (111) directions. An approach is presented that allows to determine, in combination with the simulation of transverse scans, the SF density from the simulation of the diffuse intensity streaks. SF densities as low as 0.4 × 10~3 cm~(-1) could be detected in high-quality CF-PVT grown crystals.
机译:通过高分辨率X射线往复空间映射研究了通过连续进料物理气相传输(CF-PVT)生长的厚3C-SiC单晶。这些晶体包含位于{111}平面中的Shockley型堆积层错(SF),这会引起沿(111)方向的扩散强度条纹。提出了一种方法,该方法可以与横向扫描的模拟相结合,从漫射强度条纹的模拟中确定SF密度。高质量CF-PVT生长晶体中的SF密度低至0.4×10〜3 cm〜(-1)。

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