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Terahertz transmission through p~+ porous silicon membranes

机译:太赫兹透过p〜+多孔硅膜的传输

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We report an experimental measurement of far infrared dielectric properties of p~+-doped free-standing porous silicon membranes, characterized using terahertz time-domain spec-troscopy. Freshly fabricated hydrogen-terminated porous silicon samples exhibited significant absorption in the terahertz regime, and the absorption was observed to slowly drift in response to the surrounding environment and the duration of illumination. Samples that are partially oxidized, either by age or through thermal oxidation in an oven, become almost transparent in the terahertz spectral regime, and the dielectric properties stabilize to a constant value.rnThe partially-oxidized porous silicon samples are observed to have an absorption coefficient of approximately 2 cm~(-1) over the range of 0-2 THz, which corresponds to an effective resistivity of 35 ± 9 Ω cm, approximately four orders of magnitude higher than that of the crystalline silicon from which they were formed. Spectral transmission measurements further confirm that p~+ porous silicon has no significant absorption peaks or other spectral variation in the 0-2 THz regime. These findings suggest that p~+ porous silicon could be a useful material for fabricating future THz devices.
机译:我们报告了使用太赫兹时域光谱学表征的p〜+掺杂自立多孔硅膜的远红外介电性能的实验测量。新鲜制造的氢封端的多孔硅样品在太赫兹状态下表现出显着的吸收,并且观察到该吸收随周围环境和照明持续时间而缓慢漂移。通过老化或在烤箱中进行热氧化而被部分氧化的样品在太赫兹光谱范围内几乎变为透明,并且介电性能稳定在恒定值.rn观察到部分氧化的多孔硅样品具有吸收系数在0-2 THz的范围内约为2 cm〜(-1),相当于有效电阻率35±9Ωcm,比形成它们的晶体硅的电阻率高大约四个数量级。光谱透射测量进一步证实,p +多孔硅在0-2 THz范围内没有明显的吸收峰或其他光谱变化。这些发现表明,p +多孔硅可能是制造未来太赫兹器件的有用材料。

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