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Transmission and emission characteristics of porous silicon in terahertz from 0.5T to 10T

机译:太赫兹多孔硅的传输和排放特性从0.5t到10t

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In order to develop silicon-based modulation or emission materials, silicones covered by porous silicon (ps) thin film were characterized about terahertz transmission and emission properties from 0.5T to 10T frequency by THz Time Domain spectrograph. Ps films were etched different morphologies through hydrothermal method. According to SEM, micro-surface-structures of these ps films were divided into three types: crater, quasi nano-pillar-array and porous. Terahertz wave transmission amplitude of cater samples was decreased largest and its transmission time delay was the least among the three samples. Compare to cater sample, THz transmission intensity of quasi-nano-pillar sample increased 27%, porous one increased 53%. For time delay, quasi-nano-pillar sample was 0.04ps, porous one was 0.3ps. The first two type's samples had low-pass characteristics and porous samples had cascade band-pass characteristic. There were much absorption peaks in the spectrum of quasi nano-pillar-array sample and porous one. Positions of these peaks had very closed relationship to the micro-surface-structures of ps thin films. In addition, samples could generate μW THz emission at 10THz area after excitation by femtosecond laser. Experiments showed that, both shape and size of these ps films appeared to change and control transmission and emission properties of silicon in 0.5T to 10T, such as transmitted intensity, absorption frequency and emission properties, so nano-micro system porous silicon could be considered as a new material for THz modulation, emission and it could be applied to make integration wide-spectral device.? (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
机译:为了开发基于硅基调制或发射材料,通过Thz时域光谱仪对由多孔硅(PS)薄膜覆盖的硅(PS)薄膜覆盖的硅氧烷和发射特性为0.5t至10T频率。通过水热法蚀刻PS膜的不同形态。根据SEM,将这些PS薄膜的微表面结构分为三种类型:火山口,准纳米柱阵列和多孔。 Terahertz波传递幅度的烧架样品的幅度最大,并且其传输时间延迟是三个样品中最少的。与迎宾样品相比,准纳米柱样品的THz传输强度增加了27%,多孔占53%。对于时间延迟,准纳米柱样品为0.04ps,多孔是0.3ps。前两种类型的样品具有低通特性,多孔样品具有级联带通特性。准纳米柱阵列样品的光谱中存在太大的吸收峰和多孔峰。这些峰的位置与PS薄膜的微表面结构具有非常封闭的关系。此外,在由飞秒激光激发后,样品可以在10Thz区域产生μWTHz发射。实验表明,这些PS膜的两种形状和尺寸似乎在0.5T至10T中的硅的变化和排放特性,例如透射强度,吸收频率和发射性能,因此可以考虑纳米微系统多孔硅。作为THz调制,发射的新材料,可以应用于进行集成宽光谱装置。 (2012)照片光学仪表工程师(SPIE)的版权协会。仅供个人使用的摘要下载。

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