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Optical anisotropy of A- and M-plane InN grown on free-standing GaN substrates

机译:在独立式GaN衬底上生长的A和M平面InN的光学各向异性

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摘要

Wurtzite A- and M-plane InN films were grown by molecular beam epitaxy (MBE) on free-standing GaN substrates. Spectroscopic ellipsometry (SE) in the photon energy range from 0.56 up to 15 eV was applied in order to determine the ordinary and extraordinary complex dielectric function (DF) of InN. A distinct optical anisotropy was found over the wholernenergy range. The extraordinary absorption edge in comparison to the ordinary one is shifted to higher energies confirming previous studies. The investigations in the upper vacuum-ultraviolet (VUV) spectral range (9.5-15 eV) yielded transition energies for four critical points (CPs) of the band structure (BS) which have not been observed so far.
机译:通过分子束外延(MBE)在独立的GaN衬底上生长纤锌矿A和M平面InN薄膜。为了确定InN的平凡和非凡的复介电函数(DF),使用了在光子能量范围从0.56到15 eV的椭圆偏振光谱(SE)。在整个能量范围内发现了明显的光学各向异性。与普通吸波材料相比,非凡的吸波材料转移到了更高的能量,从而证实了先前的研究。在高真空-紫外(VUV)光谱范围(9.5-15 eV)中的研究产生了迄今为止尚未观察到的能带结构(BS)的四个临界点(CP)的跃迁能。

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  • 来源
    《Physica status solidi》 |2010年第5期|P.1062-1065|共4页
  • 作者单位

    Institut fuer Mikro- und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    rnInstitut fuer Mikro- und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    rnInstitut fuer Mikro- und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    rnInstitut fuer Mikro- und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    rnInstitut fuer Experimentelle Physik, Otto-von-Guericke-Universitat Magdeburg, Universitaetsplatz 2, 39106 Magdeburg, Germany;

    rnInstitut fuer Experimentelle Physik, Otto-von-Guericke-Universitat Magdeburg, Universitaetsplatz 2, 39106 Magdeburg, Germany;

    rnInstitut fuer Experimentelle Physik, Otto-von-Guericke-Universitat Magdeburg, Universitaetsplatz 2, 39106 Magdeburg, Germany;

    rnMaterials Department, University of California, Santa Barbara, California 93106, USA Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany;

    rnMaterials Department, University of California, Santa Barbara, California 93106, USA;

    rnInstitut fuer Mikro- und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    InN films; MBE; optical anisotropy; VUV spectra;

    机译:电影中MBE;光学各向异性特别的;

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