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Top- and bottom-illumination of solar-blind AlGaN metal-semiconductor-metal photodetectors

机译:太阳盲AlGaN金属-半导体-金属光电探测器的顶部和底部照明

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摘要

The spectral performance of solar-blind Al_xGa_(1-x)N based metal-semiconductor-metal ultra-violet photodetectors has been measured for top as well as bottom-illumination at different bias voltages. In the bottom-illumination case the external quantum efficiency spectra can be tuned between a peak or a broad wavelength spectrum by adjusting absorber layer thickness and applied bias voltage. For thin absorber layers the external quantum efficiency is enhanced by a factor of three, reaching 20% quantum efficiency at 20 V bias, compared to the front-illumination case. Results of two-dimensional device simulations are well in agreement with the experimental findings. From these simulations it can be concluded, that the different spectral response for top- and bottom-illumination results from the different overlap of optical carrier generation by absorption and carrier transport by the electric field. Spectra of external quantum efficiency of solar-blind metal-semiconductor-metal photodetectors upon top-illumination (dashed) and bottom-illumination (continuous) at 1V, 5 V, and 20 V bias voltage. The Al_(0.5)Ga_(0.5)N absorber layers of different thickness d_(Abs) were grown on AlN/sapphire templates.
机译:已经测量了基于太阳盲的Al_xGa_(1-x)N基金属-半导体-金属紫外光电探测器的光谱性能,以了解在不同偏置电压下的顶部和底部照明。在底部照明的情况下,可以通过调整吸收层的厚度和施加的偏置电压在峰值或宽波长光谱之间调整外部量子效率光谱。对于薄吸收层,与前照明情况相比,外部量子效率提高了三倍,在20 V偏压下达到了20%的量子效率。二维设备仿真的结果与实验结果非常吻合。从这些模拟可以得出结论,顶照和底照的不同光谱响应是由于电场吸收和载流子传输产生的载流子重叠不同而引起的。当在1V,5V和20V偏置电压下进行顶部照明(虚线)和底部照明(连续)时,太阳盲金属-半导体-金属光电探测器的外部量子效率光谱。在AlN /蓝宝石模板上生长不同厚度d_(Abs)的Al_(0.5)Ga_(0.5)N吸收层。

著录项

  • 来源
    《Physica status solidi》 |2015年第5期|1021-1028|共8页
  • 作者单位

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4 12489 Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4 12489 Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4 12489 Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4 12489 Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4 12489 Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4 12489 Berlin, Germany;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AlGaN; device simulations; metal-semiconductor-metal structures; solar-blind photodetectors;

    机译:氮化铝镓;设备仿真;金属-半导体-金属结构;日盲光电探测器;

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