机译:AlScN薄膜热释电系数的温度依赖性
Laboratory for Compound Semiconductor Microsystems IMTEK-Department of Microsystems Engineering University of Freiburg Georges-Koehler-Allee 103, 79110 Freiburg, Germany;
Fraunhofer Institute for Applied Solid State Physics Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute for Applied Solid State Physics Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute for Applied Solid State Physics Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute for Applied Solid State Physics Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute for Applied Solid State Physics Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute for Applied Solid State Physics Tullastrasse 72, 79108 Freiburg, Germany Laboratory for Power Electronics INATECH-Department of Sustainable Systems EngineeringEmmy-Noether-Straße 2, 79110 Freiburg, Germany;
aluminum scandium nitride; magnetron sputtering; pyroelectric effect; pyroelectric properties; thin films;
机译:Bi 3.15 sub> Eu 0.85 sub> Ti 3 sub> O 12 sub>薄膜的有效压电系数的退火温度依赖性
机译:Alscn薄膜的亚微米热层析术
机译:Al_2O_3基体上掺W VO_2薄膜在室温下的高温电阻系数及其厚度依赖性
机译:AlScN薄膜的压电系数比较
机译:Marangoni驱动的薄膜中温度依赖性的建模
机译:具有超高温电阻系数的基于石墨烯的中红外室温热电测辐射热仪
机译:Alscn薄膜的亚微米热层析术