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A Comparative Study of InGaN/GaN Multiple-Quantum-Well Solar Cells Grown on Sapphire and AlN Template by Metalorganic Chemical Vapor Deposition

机译:金属有机化学气相沉积在蓝宝石和AlN模板上生长的InGaN / GaN多量子阱太阳能电池的比较研究

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Two kinds of substrates, sapphire and AlN/sapphire template (AlN template), are used for the growth of InGaN/GaN multi-quantum-well solar cell structures by metalorganic chemical vapor deposition, and their material and device properties are investigated. The results show that the samples grown on AlN template have a better crystal quality with a larger in-plane compressive strain than those on sapphire, and solar cells fabricated on sapphire mostly exhibit better performance than those on AlN template. An analysis of the photoluminescence measurements indicates that a critical InGaN well thickness related to the generation of nonradiative recombination centers, which affects the internal and external quantum efficiencies, is thinner in samples grown on AlN template than in samples on sapphire. The critical thickness is speculated to be related to the large in-plane compressive strain in the samples on AlN template. By contrast, in comparison between samples with a sufficiently thin InGaN well thickness of 1.0 nm, the sample on AlN template exhibites better solar cell performance than on sapphire. This implies that the improved crystal quality contributes to the improvement of internal quantum efficiency as long as the well layer is thinner than the critical thickness.
机译:蓝宝石和AlN /蓝宝石模板(AlN模板)两种衬底用于通过金属有机化学气相沉积法生长InGaN / GaN多量子阱太阳能电池结构,并研究了它们的材料和器件性能。结果表明,在AlN模板上生长的样品具有比蓝宝石上更高的晶体质量和更大的面内压缩应变,并且在蓝宝石上制造的太阳能电池大多表现出比在AlN模板上更好的性能。对光致发光测量结果的分析表明,与影响内部和外部量子效率的非辐射复合中心的产生有关的关键InGaN阱厚度,在AlN模板上生长的样品中比在蓝宝石上的样品中更薄。据推测,临界厚度与AlN模板上样品中的较大面内压缩应变有关。相比之下,在具有1.0 nm足够薄的InGaN阱厚度的样品之间进行比较,在AlN模板上的样品比在蓝宝石上的样品具有更好的太阳能电池性能。这意味着只要阱层比临界厚度薄,改善的晶体质量就有助于内部量子效率的提高。

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  • 来源
    《Physica status solidi》 |2018年第10期|1700323.1-1700323.7|共7页
  • 作者单位

    Research Center for Nano Devices and Advanced Materials Nagoya Institute of Technology Nagoya 466-8555, Japan,Innovation Center for Multi-Business of Nitride Semiconductors Nagoya Institute of Technology Nagoya 466-8555, Japan;

    Research Center for Nano Devices and Advanced Materials Nagoya Institute of Technology Nagoya 466-8555, Japan;

    Research Center for Nano Devices and Advanced Materials Nagoya Institute of Technology Nagoya 466-8555, Japan,Innovation Center for Multi-Business of Nitride Semiconductors Nagoya Institute of Technology Nagoya 466-8555, Japan;

    Research Center for Nano Devices and Advanced Materials Nagoya Institute of Technology Nagoya 466-8555, Japan;

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