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首页> 外文期刊>Physica Status Solidi. C, Conferences and critical reviews >High transparency low resistance oxidized Ni/Au-ZnO contacts to p-GaN for high performance LED applications
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High transparency low resistance oxidized Ni/Au-ZnO contacts to p-GaN for high performance LED applications

机译:高透明性低电阻氧化Ni / Au-ZnO与p-GaN接触,用于高性能LED应用

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This paper presents high-transparency low-resistance contact on p-GaN using oxidized Ni/Au-ZnO:Al_2O_3(2 wt%) for high-performance GaN-based light-emitting diodes (LEDs) applications. It is shown that oxidized Ni/Au-ZnO contact to p-GaN yields an operating voltage of around 4.7 V at 20 mA compared to 4.1 V of a reference oxidized Ni/Au(5 nm/5 nm)-Ni/Au(20 nm/120 nm) sample without the ZnO: Al_2O_3(2 wt%) layer. Enhancement of transmittance of about 60% at the wavelength of 450 nm over a conventional N_2-annealed semi-transparent Ni/Au(5 nm/5 nm) contact is measured on glass substrates.
机译:本文介绍了使用氧化的Ni / Au-ZnO:Al_2O_3(2 wt%)在p-GaN上的高透明低电阻接触,用于高性能GaN基发光二极管(LED)应用。结果表明,氧化的Ni / Au-ZnO与p-GaN的接触在20 mA下产生的工作电压约为4.7 V,而参考氧化的Ni / Au(5 nm / 5 nm)-Ni / Au(20 ZnO:Al_2O_3(2 wt%)层)。在玻璃基板上,测量了常规N_2退火的半透明Ni / Au(5 nm / 5 nm)接触点在450 nm波长处的透射率提高了约60%。

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