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首页> 外文期刊>Physica Status Solidi. C, Conferences and critical reviews >Preparation of ternary Cd_(1-x)Zn_xS alloy by photochemical deposition (PCD) and its application to photovoltaic devices
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Preparation of ternary Cd_(1-x)Zn_xS alloy by photochemical deposition (PCD) and its application to photovoltaic devices

机译:光化学沉积法制备Cd_(1-x)Zn_xS三元合金及其在光伏器件中的应用

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摘要

p-SnS-Cd_(1-x)Zn_xS heterojunctions were fabricated by using pulsed electrochemical deposition (P-ECD) and photochemical deposition (PCD) methods. CdSO_4, ZnSO_4 and Na_2S_2O_3 were used for the deposition of Cd_(1-x)Zn_xS alloys by PCD method on the indium-tin-oxide (ITO) coated glass substrates. The x values in the Cd_(1-x)Zn_xS were varied by changing the Na_2S_2O_3 concentration in the deposition bath. SnS layer was deposited by P-ECD using SnSO_4 and Na_2S_2O_3. The composition details of the n-Cd_(1-x)Zn_xS window layer were estimated from LO (longitudinal optical) phonon frequency observed from the Raman studies. The photovoltaic properties of the fabricated solar cell structure glass/ITO/ Cd_(1-x)Zn_xS /SnS/In are characterised under the photon intensity 100 mW/cm~2 and we observed the short circuit current density as 4.8 mA/cm~2, open circuit voltage as 280 mV and fill factor as 0.34.
机译:采用脉冲电化学沉积(P-ECD)和光化学沉积(PCD)方法制备了p-SnS / n-Cd_(1-x)Zn_xS异质结。使用CdSO_4,ZnSO_4和Na_2S_2O_3通过PCD方法在涂有铟锡氧化物(ITO)的玻璃基板上沉积Cd_(1-x)Zn_xS合金。通过改变沉积浴中的Na_2S_2O_3浓度来改变Cd_(1-x)Zn_xS中的x值。使用SnSO_4和Na_2S_2O_3通过P-ECD沉积SnS层。 n-Cd_(1-x)Zn_xS窗口层的成分详细信息是根据从拉曼研究中观察到的LO(纵向光学)声子频率估算的。在光子强度为100 mW / cm〜2的条件下表征了制备的太阳能电池结构玻璃/ ITO / Cd_(1-x)Zn_xS / SnS / In的光伏性能,观察到的短路电流密度为4.8 mA / cm〜。 2,开路电压为280 mV,填充系数为0.34。

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