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首页> 外文期刊>Physica Status Solidi. C, Conferences and critical reviews >Two-dimensional simulation of type-Ⅱ InP/GaAsSb/InP double heterojunction bipolar transistors
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Two-dimensional simulation of type-Ⅱ InP/GaAsSb/InP double heterojunction bipolar transistors

机译:Ⅱ型InP / GaAsSb / InP双异质结双极晶体管的二维仿真

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摘要

Two-dimensional (2D) numerical simulations of self-aligned sub-micron InP/GaAsSb double heterojunc-tion bipolar transistors (DHBTs) were performed to investigate the effects of base band gap narrowing and surface recombination. Base energy band gaps of 0.72 eV and 0.67 eV for GaAs_(0.51)Sb_(0.49) bases with doping levels of 5 x 10~(18) and 5 x 10~(19) cm~(-3) were extracted from the comparison between the measurement data and simulation results. We took into account the surface Fermi level pinning and introduced a surface state model for the emitter side wall and extrinsic base surface. To the best of our knowledge, a good match between measured and simulated InP/GaAsSb DHBTs characteristics, from low to high current densities has not been achieved prior to the present work.
机译:对自对准亚微米InP / GaAsSb双异质结双极晶体管(DHBT)进行了二维(2D)数值模拟,以研究基带隙变窄和表面重组的影响。从比较中获得了掺杂水平为5 x 10〜(18)和5 x 10〜(19)cm〜(-3)的GaAs_(0.51)Sb_(0.49)碱的0.72 eV和0.67 eV的基带隙。在测量数据和模拟结果之间。我们考虑了表面费米能级钉扎,并为发射器侧壁和非本征基面引入了表面状态模型。据我们所知,在当前工作之前,还没有实现从低到高电流密度的测量和模拟InP / GaAsSb DHBT特性之间的良好匹配。

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