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Effect of AIGaAs cladding layer on GaInNAs/GaAs MQW p-i-n photodetector

机译:AIGaAs包覆层对GaInNAs / GaAs MQW p-i-n光电探测器的影响

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摘要

The electronic properties of GaInNAs/GaAs multiple-quantum-well (MQW) p-i-n photodetector with AIGaAs cladding layer have been studied. By applying a higher band gap Alo.3Gao.7As to the photodetector, a substantial reduction in dark current was observed owing to an inherent difficulty for holes to surmount the high potential barrier between MQW and the cladding layer heterojunction under a reverse bias. The dark current obtained was as low as 4.1 pA at -3.5 V for a device with Alo.3Gao.7As cladding layer as compared to 22 uA also at -3.5 V for a similar device without thernAlo.3Gao.7As cladding layer. The photo/dark current contrast ratios obtained were 4.2×10~4 and 11, respectively, for devices with and without an Al_(0.3)Ga_(0.7)As cladding layer at -3.5 V. In addition, peak responsivity of 1 mA/W was measured at around 1150 nm. Two orders of magnitude increase in the rejection ratio were realized between 1150 and 1250 nm at -2.0 V. The GaInNAs/GaAs MQW p-i-n photodetector was demonstrated with the AIGaAs cladding layer potentially providing a higher photo/dark current contrast ratio and higher responsivity rejection ratio.
机译:研究了具有AlGaAs包覆层的GaInNAs / GaAs多量子阱(MQW)p-i-n光电探测器的电子性能。通过将较高的带隙Alo0.3Gao.7As应用于光电检测器,可以观察到暗电流的显着降低,这是由于空穴在反向偏压下难以克服MQW和覆层异质结之间的高势垒所固有的困难。具有Alo.3Gao.7As覆层的器件在-3.5 V时获得的暗电流低至4.1 pA,而对于没有theAlo.3Gao.7As覆层的相似器件,在-3.5 V时仅为22 uA。对于具有和不具有-3.5 V的Al_(0.3)Ga_(0.7)As包覆层的器件,获得的光/暗电流对比度分别为4.2×10〜4和11。峰值响应度为1 mA / W在约1150nm处测量。在-2.0 V的1150至1250 nm之间,抑制比实现了两个数量级的提高。GaInNAs/ GaAs MQW引脚光电探测器采用AIGaAs包覆层进行了演示,有望提供更高的光/暗电流对比度和更高的响应抑制比。

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  • 来源
    《Physica status solidi》 |2008年第6期|2136-2138|共3页
  • 作者单位

    Institute of Microelectronics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan;

    Institute of Microelectronics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan;

    Institute of Microelectronics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan;

    Institute of Microelectronics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan;

    Advanced Device Technology Department, Taiwan Semiconductor Manufacturing Company Ltd., Tainan 741, Taiwan;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    Ⅲ-Ⅴ semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions; photodetectors (including infrared and CCD detectors);

    机译:Ⅲ-Ⅴ半导体与半导体的接触;p-n结和异质结;光电探测器(包括红外和CCD探测器);

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