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机译:粗线网格的自恢复图像:在相干EUV Talbot光刻中的应用
Chair for the Experimental Physics of EUV, RWTH Aachen University and Jülich Aachen Research Alliance, Fundamentals for Future Information Technology (JARA-FIT), Aachen, Germany;
Engineering Research Center for Extreme Ultraviolet Science and Technology and the Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO, USA;
Engineering Research Center for Extreme Ultraviolet Science and Technology and the Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO, USA;
Optoelectronics Research Centre, University of Southampton, Southampton, U.K.;
Chair for the Experimental Physics of EUV, RWTH Aachen University and Jülich Aachen Research Alliance, Fundamentals for Future Information Technology (JARA-FIT), Aachen, Germany;
Lithography; Ultraviolet sources; Image edge detection; Resists; Gratings; Lighting; Image restoration;
机译:通过复合Messcale幅度相位掩模,自我图像对塔巴多特光刻的对比度增强
机译:在瑞士光源和上海同步辐射装置上使用EUV消色差Talbot光刻对纳米点阵列进行图案化
机译:相干EUV照明下2D分数Talbot图案的光学性质
机译:宽谱控制光谱谱仪,用于EUV光刻应用:设定点光谱仪,Ogden,犹他州 - EUV光刻 - (PPT)
机译:通过台式系统中的相干Talbot光刻技术制造的周期性金属纳米结构。
机译:高敏感性抗蚀性对EUV光刻进行抗衡性:材料设计策略和绩效结果综述
机译:粗线网格的自恢复图像:在相干EUV Talbot光刻中的应用