首页> 外文期刊>Organic Electronics >Doping induced performance enhancement in inverted small molecule organic photodiodes operating below 1V reverse bias - Towards compatibility with CMOS for imaging applications
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Doping induced performance enhancement in inverted small molecule organic photodiodes operating below 1V reverse bias - Towards compatibility with CMOS for imaging applications

机译:在1V反向偏置以下工作的反向小分子有机光电二极管中,掺杂诱导的性能增强-与成像应用的CMOS兼容

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摘要

Organic photodiodes (OPDs) offer a myriad of advantages over conventional inorganic photodetectors, making them particularly attractive for imaging application. One of the key challenges preventing their utilization is the need for their integration into the standard CMOS processing. Herein, we report a CMOS-compatible top-illuminated inverted small molecule bi-layer OPD with extremely low dark leakage current. The device utilizes a titanium nitride (TiN) bottom electrode modified by a [6,6]-phenyl C-61 butyric acid methyl ester (PCBM) cathode buffer layer (CBL). We systemetically show that doping the CBL enhances device's low voltage (below 1 V reverse bias) photoresponse by increasing the linear dynamic range (LDR) and making the bandwidth of the photodidoe broader without compromising the leakage current. The optimized device exhibits a dark leakage current of only similar to 6 x 10(-10) A/cm(2) at -0.5 V. The external quantum efficiency (EQE) at 500 nm reaches 23% with a calculated specific detectivity as high as 7.15 x 10(12) cm Hz(1/2)/W (Jones). Also the LDR approaches 140 dB and the bandwidth is about 400 kHz, at - 0.5 V bias. The proposed device structure is fully compatible with CMOS processing and can be integrated onto a CMOS readout circuit offering the potential to be applied in high-performance large-scale imaging arrays.
机译:与常规的无机光电探测器相比,有机光电二极管(OPD)具有无数的优势,这使其特别适合成像应用。阻止其利用的主要挑战之一是需要将它们集成到标准CMOS处理中。在此,我们报道了具有极低暗漏电流的CMOS兼容顶部照明倒置小分子双层OPD。该设备利用由[6,6]-苯基C-61丁酸甲酯(PCBM)阴极缓冲层(CBL)改性的氮化钛(TiN)底部电极。我们系统地表明,掺杂CBL可通过增加线性动态范围(LDR)并在不影响泄漏电流的情况下使光电二极管的带宽变宽来增强器件的低压(低于1 V反向偏置)的光响应。经过优化的器件在-0.5 V电压下的暗泄漏电流仅类似于6 x 10(-10)A / cm(2)。在500 nm处的外部量子效率(EQE)达到23%,并且计算出的比检测率很高为7.15 x 10(12)cm Hz(1/2)/ W(琼斯)。同样,LDR接近140 dB,在-0.5 V偏置下,带宽约为400 kHz。所提出的器件结构与CMOS处理完全兼容,并且可以集成到CMOS读出电路中,从而有可能应用于高性能大规模成像阵列。

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  • 来源
    《Organic Electronics》 |2019年第4期|1-9|共9页
  • 作者单位

    Technion Israel Inst Technol, Microelect & Nanoelect Ctr, Elect Engn Dept, IL-32000 Haifa, Israel;

    Kirchhoff Inst Phys, Neuenheimer Feld 227, D-69120 Heidelberg, Germany|Ctr Adv Mat, Neuenheimer Feld 227, D-69120 Heidelberg, Germany;

    Technion Israel Inst Technol, Microelect & Nanoelect Ctr, Elect Engn Dept, IL-32000 Haifa, Israel;

    Tower Semicond Ltd, TowerJazz, IL-2310502 Migdal Haernek, Israel;

    Tower Semicond Ltd, TowerJazz, IL-2310502 Migdal Haernek, Israel;

    Tower Semicond Ltd, TowerJazz, IL-2310502 Migdal Haernek, Israel;

    Kirchhoff Inst Phys, Neuenheimer Feld 227, D-69120 Heidelberg, Germany|Ctr Adv Mat, Neuenheimer Feld 227, D-69120 Heidelberg, Germany;

    Technion Israel Inst Technol, Microelect & Nanoelect Ctr, Elect Engn Dept, IL-32000 Haifa, Israel;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Organic photodiode; Titanium nitride; Interface engineering; Cathode buffer layer; Doping; CMOS;

    机译:有机光电二极管氮化钛接口工程阴极缓冲层掺杂CMOS;

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