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Study on Carrier transportation in InGaN based green LEDs with V-pits structure in the active region

机译:有源区中具有V坑结构的InGaN基绿色LED中载流子传输的研究

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摘要

InGaN based LEDs with V-pits structure and consists of n-GaN, In0.1Ga0.9N/GaN superlattices (SLs), In0.25Ga0.85N blue quantum wells (BQWs), In(0.25)G(a0.75)N green quantum wells (GQWs) and p-GaN were grown on Si substrate. Carrier transportation is studied by temperature-dependent electroluminescence (TDEL). With n-doping in the SLs and BQWs, the major emission peak is from the GQWs. Under low temperature and high injection current, side peaks emitted form SLs and BQWs can be observed. Reducing the number of GQWs will result in stronger side peaks. We propose that the disequilibrium in carrier concentration bring high drift velocity to the holes, partial holes fly across the sidewall of V-pits to n-side and recombined with the electrons in the BQWs and SLs.
机译:具有V坑结构的InGaN基LED,由n-GaN,In0.1Ga0.9N / GaN超晶格(SLs),In0.25Ga0.85N蓝色量子阱(BQW),In(0.25)G(a0.75)N组成在Si衬底上生长绿色量子阱(GQW)和p-GaN。通过与温度有关的电致发光(TDEL)研究载流子的运输。在SL和BQW中进行n掺杂时,主要的发射峰来自GQW。在低温和高注入电流下,可以观察到从SL和BQW发出的侧峰。减少GQW的数量将导致更强的侧峰。我们提出,载流子浓度的不平衡会给空穴带来高漂移速度,部分空穴跨过V坑的侧壁飞向n侧,并与BQW和SL中的电子重新结合。

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