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An InGaN/GaN Superlattice to Enhance the Performance of Green LEDs: Exploring the Role of V-Pits

机译:InGaN / GaN超晶格可增强绿色LED的性能:探索V型坑的作用

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摘要

Despite the fact that an InGaN/GaN superlattice (SL) is useful for enhancing the performance of a GaN-based light-emitting diode (LED), its role in improving the efficiency of green LEDs remains an open question. Here, we investigate the influence of a V-pits-embedded InGaN/GaN SL on optical and electrical properties of GaN-based green LEDs. We recorded a sequence of light emission properties of InGaN/GaN multiple quantum wells (MQWs) grown on a 0- and 24-pair InGaN/GaN SL by using scanning electron microscopy (SEM) in combination with a room temperature cathodoluminescence (CL) measurement, which demonstrated the presence of a potential barrier formed by the V-pits around threading dislocations (TDs). We find that an increase in V-pit diameter would lead to the increase of V-pit potential barrier height. Our experimental data suggest that a V-pits-embedded, 24-pair InGaN/GaN SL can effectively suppress the lateral diffusion of carriers into non-recombination centers. As a result, the external quantum efficiency (EQE) of green LEDs is improved by 29.6% at an injection current of 20 mA after implementing the V-pits-embedded InGaN/GaN SL layer. In addition, a lower reverse leakage current was achieved with larger V-pits.
机译:尽管InGaN / GaN超晶格(SL)可用于增强GaN基发光二极管(LED)的性能,但其在提高绿色LED效率方面的作用仍然是一个悬而未决的问题。在这里,我们研究了嵌入V坑的InGaN / GaN SL对基于GaN的绿色LED的光学和电学性质的影响。我们使用扫描电子显微镜(SEM)结合室温阴极发光(CL)测量记录了在0对和24对InGaN / GaN SL上生长的InGaN / GaN多量子阱(MQW)的发光特性序列。 ,表明存在由螺纹位错(TD)周围的V型坑形成的势垒。我们发现,V型坑直径的增加将导致V型坑势垒高度的增加。我们的实验数据表明,嵌入V坑的24对InGaN / GaN SL可以有效地抑制载流子向非复合中心的横向扩散。结果,在实现嵌入V坑的InGaN / GaN SL层之后,在20 mA的注入电流下,绿色LED的外部量子效率(EQE)提高了29.6%。此外,使用较大的V形孔可获得较低的反向漏电流。

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