机译:快速热蒸发和脉冲激光沉积制备(Ag3AsS3)(0.6)(As2S3)(0.4)薄膜的光学参数的温度研究
Uzhgorod Natl Univ Fac Phys Dept Appl Phys 3 Narodna Sq UA-88000 Uzhgorod Ukraine;
Univ Debrecen Fac Sci & Technol Dept Expt Phys 18-A Bem Sq H-4026 Debrecen Hungary;
Univ Pardubice Fac Chem Technol Dept Graph Arts & Photophys Studentska 573 Pardubice 53210 Czech Republic;
Thin film; Rapid thermal evaporation; Pulse laser deposition; Urbach absorption edge; Electron-phonon interaction; Refractive index;
机译:通过脉冲激光沉积制备的可调谐低损耗Ba_(0.6)Sr_(0.4)TiO_3 / Bi_(1.5)Mg_(1.0)Nb_(1.5)O_7 / Ba_(0.6)Sr_(0.4)TiO_3多层薄膜
机译:脉冲激光沉积制备Ba / sub 0.6S / r / sub 0.4 / Cr / sub x / Ti / sub 1-x / O / sub 3 /薄膜的介电性能
机译:沉积温度对脉冲激光沉积Ba_(0.6)Sr_(0.4)TiO_3薄膜结构和介电性能的影响
机译:脉冲激光沉积制备三明治结构'(Ag_3AsS_3)_(0.6)(As_2S_3)_(0.4)薄膜-金纳米粒子的光吸收
机译:用于薄膜沉积的基质辅助脉冲激光蒸发(MAPLE)技术的分子能级机理的计算研究。
机译:脉冲激光沉积法制备MgAl2O4-(Ni0.5Zn0.5)Fe2O4薄膜的磁性和光学性质
机译:基于(Ag3Ass3)0.6(As2S3)0.4薄膜和金纳米颗粒的夹层结构中光学吸收的温度研究