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Transparent with wide band gap InZnO nano thin film: Preparation and characterizations

机译:具有宽带隙的InZnO纳米薄膜的透明薄膜:制备与表征

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Novel indium zinc oxide (InZnO) thin film of 100 nm thickness was prepared onto pre-cleaned glass plate by thermal evaporation technique from InZnO nanoparticles. The metal oxide (In-O and Zn-O) bond and In, Zn and O elements present in the films were confirmed by Fourier transform infrared spectroscopy and energy dispersive X-ray spectroscopy. The X-ray diffraction patterns revealed the mixed phase of cubic In2O3 and wurzite-hexagonal ZnO structure. SEM images showed smooth surface with uniform distribution of grains (201-240 nm) over the entire film surface. High transparency and low absorption obtained from optical study. The band gap energy was evaluated to be about 3.46-3.55 eV by Tauc's plot. The structure, smooth surface and high transparency with wide band gap energy lead the thermally evaporated InZnO nano thin film to be used for transparent layer in optoelectronic devices in the future. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过热蒸发技术从InZnO纳米颗粒上制备了厚度为100 nm的新型铟锌氧化物(InZnO)薄膜。膜中存在的金属氧化物(In-O和Zn-O)键以及In,Zn和O元素通过傅里叶变换红外光谱和能量色散X射线光谱法确认。 X射线衍射图谱显示立方In 2 O 3和纤锌矿型六方ZnO结构的混合相。 SEM图像显示光滑的表面,在整个膜表面上具有均匀的晶粒分布(201-240 nm)。通过光学研究获得的高透明性和低吸收性。根据Tauc的图,带隙能量约为3.46-3.55 eV。具有宽带隙能量的结构,光滑的表面和高透明性使得热蒸发的InZnO纳米薄膜在未来可用于光电器件的透明层。 (C)2015 Elsevier B.V.保留所有权利。

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