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Influence of the thermal treatment on the optical and structural properties of 1.3 μm emitting quantum dots (QDs) grown by LP-MOVPE grown InAs/GaAs quantum dots

机译:热处理对LP-MOVPE生长的InAs / GaAs量子点生长的1.3μm发射量子点(QD)光学和结构性质的影响

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摘要

The optical and structural properties of a single array of 1.3 μm emitting quantum dots (QDs) grown by LP- MOVPE are presented after different thermal treatments (between 570deg.C under arsine flux during 25 min) Simulating the overgrowth of the confinement layers for broad area lasers. The photoluminescence (PL) efficiency of the 1.3 μm line is not affected by a thermal treatment below 620deg.C. Nevertheless, a drastic decrease of the 1.3 μm peak intensity occurs for higher anneal temperature (670deg.C), together with an important blueshift of the PL spectrum (=40 meV).
机译:在经过不同的热处理(在25分钟的砷化氢流量下于570摄氏度之间,经过25分钟)处理后,通过LP-MOVPE生长的单个1.3μm发射量子点(QD)阵列的光学和结构特性得到了模拟区域激光器。 1.3μm线的光致发光(PL)效率不受620°C以下热处理的影响。然而,对于更高的退火温度(670摄氏度),峰值强度会急剧降低1.3μm,同时PL光谱也将发生重要的蓝移(= 40 meV)。

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